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[CMP Part1] CMP Introduction (2 of 2)

Welcome to the Grand Opening of Our CMP Series, Guided by Semi Sherpa, Your Trusted Expert in the Semiconductor Cosmos In this introductory episode, we aim to equip newcomers with essential knowledge about the Chemical Mechanical Polishing (CMP) process. Our episode is organized into four distinct segments, providing a comprehensive understanding of CMP: 1. The Importance of CMP in Modern Semiconductor Manufacturing We’ll explore why CMP is vital for the performance and reliability of silicon wafers in advanced semiconductor devices. This segment also includes a brief technical history of CMP, highlighting its evolution, primarily driven by IBM, into a cornerstone of the industry. 2. Understanding the CMP Process This segment covers the fundamentals of CMP, focusing on the synergy between chemical softening and mechanical polishing that achieves the necessary planarization of wafer surfaces. 3. Introduction to CMP Equipment We’ll demystify the CMP polisher, guiding you through the CMP process with tools from Applied Materials. You’ll follow a wafer from start to finish, learning how these tools function and their role in achieving the desired surface characteristics. 4. CMP Applications in Modern Silicon Wafer Fabrication We’ll discuss how CMP has adapted to meet the demands of device miniaturization and the planarization of new materials in today’s silicon devices. Throughout this episode, we’ve intentionally avoided complex equations to keep our explanations clear and accessible. This series simplifies the intricate world of CMP, making it understandable for all Silicon Pioneers. Prepare to embark on a knowledge-rich journey into the heart of the CMP universe. Below are the main chapters of this video. Click on any timestamp to jump directly to your desired chapter. 1. Historical CMP Technology Development 2. CMP Process Introduction 3. CMP Equipment Introduction [00:30] How the CMP Polisher Operates [03:40] The History and Trends in CMP Equipment Development [06:10] Wafer Flow in CMP Equipment [09:10] Post-CMP Cleaner & Dryer [14:00] The 3 Major CMP Consumables: Slurry, Pad, Conditioner 4. CMP Application Introduction [18:20] Overview of CMP Applications in Modern Logic Chips [22:05] History of ILD CMP Development [25:20] History of W CMP Development [28:20] History of STI CMP Development [32:05] History of Cu CMP Development [35:35] History of Metal Gate CMP Development [38:55] The Expanding Role of CMP in Modern Logic Chips